工作职责:
Primary (70%):
1. Evaluate and plan new technology, handle NTO case.
2. Improve the OPC design for data collection.Design for ENG mask.
3. Manage and plan NTO reticle design and GDS drawing and GDS check.
4. Familiar with FAB photo tool Reticle design,JDV and tape out.
5. written pattern.


Secondary (30%):
1. Communicate and coordinate with other departments.
2. Others PIE related work.
任职资格:
1. Over 3 years experience in fab photo process/OPC handle/GDS drawing , be familiar with FAB reticle/OPC. Optical major prefered.
2. Exhibit good and open communication skills, be able to work within cross-functional teams.
3. Fluent in English.